Schottky emission effect in surface topography: method and application
by Albert Weckenmann, Zhengshan Sun, Alexander Schuler
International Journal of Nanomanufacturing (IJNM), Vol. 7, No. 2, 2011

Abstract: Presented here is an application of Schottky emission effect in surface topography. Since using current transfer mechanism can detect the metal or semiconductor surface structures in high resolution without contact, the tendency of Schottky emission in surface metrology is obvious. In this study, Schottky emission property in practical condition is compared both theoretically and practically into detail with tunnelling effect and field emission in order to distinguish the observed phenomena. A new developed probing system holding a thick electrical probe is exemplified to demonstrate the Schottky emission effect application in surfaces study. Future prospects of applying Schottky emission to manufacturing metrology are overviewed.

Online publication date: Sat, 28-Feb-2015

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