Performance and limitation of nanomeasuring technology Online publication date: Sat, 28-Feb-2015
by Gerd Jaeger, Eberhard Manske, Tino Hausotte
International Journal of Nanomanufacturing (IJNM), Vol. 7, No. 1, 2011
Abstract: The paper describes traceable nanometrology based on a nanomeasuring machine. The high performance of the machine is explained with a metrological analysis. This analysis shows some of today's limits of the nanopositioning and nanomeasuring engineering. The limits are based, for instance, on the metre definition as redefined in 1983 as well as on the comparison between an iodine-stabilised helium-neon laser and a stabilised helium-neon laser to be stabilised and on the influence of the refractive index of the air. In addition to the stability of the machine's metrological frame, the realisation of the Abbe comparator principle plays a fundamental role in machine design and represents a significant challenge when being applied in all axes simultaneously. There are various machines for positioning and measuring samples which are based on different working modes: scanning probe mode, mixed scanning mode and sample scanning mode. These modes are analysed with respect to first- and second-order Abbe errors.
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