Model of reactive sputtering process in deposition of TiAlN coating
by Esmar Budi, Mohd. Razali Bin Muhamad, Saifudin Hafiz Bin Yahaya, Md. Nizam Bin Abdul Rahman
International Journal of Materials Engineering Innovation (IJMATEI), Vol. 2, No. 1, 2011

Abstract: A model of the reactive sputtering process in deposition of TiAlN coating based on the influence of negatively substrate bias (-V_b) on coating composition and deposition rate at various nitrogen flow rate has been developed. TiAlN coatings were deposited by using DC magnetron sputtering. The coating composition and deposition rate were obtained by using SEM/EDX analysis. The results showed that the increase of -V_b decreased the critical nitrogen flow rate (f_N2^c). The increase of coating composition at nitrogen flow rate lower than f_N2^c with an increase in -V_b was due to increase of ion flux to the substrate while the decrease of deposition rate was due to coating densification. However, the verification data of coating composition was lower than that of model prediction due to the heterogeneous reaction between sputtered metallic particles and reactive gas at the substrate surface. The experimental results showed that the nitrogen content of unbiased substrate was consistently lower than that of biased substrate and increased with an increase in nitrogen flow rate while the deposition rate was decreased.

Online publication date: Thu, 26-Mar-2015

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Materials Engineering Innovation (IJMATEI):
Login with your Inderscience username and password:

Username:        Password:          Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com