Design and sensitivity analysis of Fresnel domain computer generated holograms
by Jose A. Dominguez-Caballero, Satoshi Takahashi, George Barbastathis, SungJin Lee
International Journal of Nanomanufacturing (IJNM), Vol. 6, No. 1/2/3/4, 2010

Abstract: An iterative algorithm used for the design and optimisation of a binary phase computer generated hologram for high-resolution lithography in on-axis and off-axis geometries is presented. A sensitivity analysis is performed to estimate the effect of CGH manufacture errors using electron-beam writing.

Online publication date: Sun, 22-Aug-2010

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