A CMOS compatible non-lithographic nanomanufacturing system Online publication date: Thu, 12-Feb-2009
by Biswajit Das, Arghya N. Banerjee
International Journal of Nanomanufacturing (IJNM), Vol. 2, No. 6, 2008
Abstract: Nanoparticles of metals and semiconductors are promising for the implementation of a variety of photonic and electronic devices with superior performances and new functionalities. However, their successful commercialisation has been limited due to the lack of appropriate implementation processes that are suitable for commercial manufacturing. The current techniques for the fabrication of nanoparticles are either solution-based thus requiring complex surface passivation, or have severe constraints. We have developed an ultra high vacuum system for the implementation of complex nanosystems that is flexible and compatible with the silicon integrated circuit process, thus making it suitable for volume manufacturing. The system also allows the fabrication of ohmic contacts and isolation dielectrics in an integrated manner, which is a requirement for most electronic and photonic devices. We have demonstrated the power and flexibility of this new system for the manufacturing of nanoscale devices by implementing a variety of structures incorporating nanoparticles.
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