Materials for lithography in the nanoscale
by Panagiotis Argitis, Dimitra Niakoula, Antonios M. Douvas, Evangelos Gogolides, Ioannis Raptis, Veroniki P. Vidali, Elias A. Couladouros
International Journal of Nanotechnology (IJNT), Vol. 6, No. 1/2, 2009

Abstract: Design and development of photoresists aiming at patterning in the nanoscale is reported. Functionalised polycarbocycle-based molecules and Polyhedral Oligomeric Silsesquioxane (POSS) containing (meth)acrylate copolymers are the basic components of the resist materials proposed for 193 nm and EUV lithography. The synthesis of new functionalised polycarbocycles aimed first at the development of etch resistance additives for 193 nm (meth) acrylate resists, since these compounds are characterised by moderate absorbance at 193 nm and by increased etch resistance due to the polyaromatic and cycloaliphatic rings they contain. Recently, additional functionalisation with appropriate imaging and hydrophilic groups advanced compounds of this class to become suitable main components of molecular resist compositions. On the other hand the incorporation of POSS groups in (meth)acrylate copolymers was studied first towards the development of 157 nm double layer resists, and recently, after the renewal of the semiconductor industry interest for 193 nm technology for double layer 193 nm resists. Characterisation methodologies for sub 100 nm thick resist films were also developed based on interferometry and used for the optimisation of the resist materials developed.

Online publication date: Sun, 30-Nov-2008

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanotechnology (IJNT):
Login with your Inderscience username and password:

Username:        Password:          Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com