PCD pad conditioners for low pressure chemical mechanical planarisation of semiconductors
by James C. Sung, Ming-Yi Tsai, Marehito Aoki, Cheng-Shiang Chou, Michael Sung
International Journal of Abrasive Technology (IJAT), Vol. 1, No. 3/4, 2008

Abstract: Instead of attaching individual diamond grits to a metal substrate, Advanced Diamond Disk (ADD) are manufactured by Electro Discharge Machining (EDM) of sintered Polycrystalline Diamond (PCD) to form cutting pyramids of a designed shape. This is not possible with single crystal diamond grits that possess obtuse solid angles for dressing plastic pads. The test data confirmed that ADD can dress pad more effectively than conventional pad conditioners with discrete diamond grits. Moreover, the service lives of ADD and pad can both be lengthened due to the much milder dressing action. These unique features of ADD can reduce significantly the Cost of Consumable (CoC) of Chemical Mechanical Planarisation (CMP) for the manufacture of advanced semiconductors.

Online publication date: Tue, 30-Sep-2008

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