MaTT, an automatic toolpath generator for laser-patterning high-aspect-ratio microstructures in photosensitive materials
by Janet A. Stillman, Jack W. Judy, Henry Helvajian
International Journal of Manufacturing Research (IJMR), Vol. 3, No. 1, 2008

Abstract: Although software exists to support the design of microelectromechanical systems fabricated with mask-based photolithography, software to generate the Computer Numerically Controlled (CNC) toolpath instructions to direct-write-pattern with lasers lags behind. This lack has slowed the development of Photostructurable Glass-Ceramics (PSGCs) for aerospace applications. A new software package, MaTT (Mask-To-Toolpath), translates designs represented in an industry-standard mask format, Caltech Interchange Format (CIF), into toolpaths for laser-patterning photosensitive materials. PSGC structures fabricated using MaTT illustrate the process. MaTT will soon be harnessed for a major research effort on glass nanosatellites. MaTT is freely available by email request.

Online publication date: Sat, 29-Dec-2007

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