Application of a coupled electromagnetic-thermal model for 2D analysis of thermal runaway
by P. Plaza-Gonzalez, J. Monzo-Cabrera, J.M. Catala-Civera, J. Escalante-Matas, J. Pitarch-Portero
International Journal of Materials and Product Technology (IJMPT), Vol. 29, No. 1/2/3/4, 2007

Abstract: In this work, a coupled electromagnetic and thermal physical model has been implemented in order to analyse the thermal runaway development during the application of microwave energy. Both static and mode-stirred microwave ovens have been analysed and its influence on the electric field and temperature patterns compared. Additionally, the continuous and pulsed uses of the microwave power source are also compared. Results indicate that temperature permittivity dependence, thermal conductivity and the electric field deposition are mainly responsible for thermal avalanche and 'hot spot' development.

Online publication date: Mon, 09-Apr-2007

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Materials and Product Technology (IJMPT):
Login with your Inderscience username and password:

Username:        Password:          Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com