Influence of substrate bias on performance of diamond coating on WC cutting inserts for machining of aluminium by HFCVD process
by Dilip Kumar Sahu; Saroj Kumar Sarangi; Kakarla Udaya Sri
International Journal of Materials Engineering Innovation (IJMATEI), Vol. 11, No. 4, 2020

Abstract: The most important factors during deposition on different carbide base cutting tool inserts by using hot filament chemical vapour deposition (HFCVD) method are nucleation and growth of diamond. The negative dc biasing is the most outstanding technique in HFCVD method for improving the nucleation on the substrate surface. In the present investigation, the main objective is to analyse the influence of bias voltage on the WC substrate for nucleation, growth, adhesion and quality of diamond coating along with evaluation of machining performance in dry environment. Finally it has been confirmed that higher nucleation density including good quality diamond coatings along with reduced cutting force and better work surface finish were achieved under a definite reaction pressure with negative substrate bias.

Online publication date: Mon, 04-Jan-2021

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Materials Engineering Innovation (IJMATEI):
Login with your Inderscience username and password:

    Username:        Password:         

Forgotten your password?


Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com