A comparative study on the effects of technology nodes and logic styles for low power high speed VLSI applications
by Inamul Hussain; Saurabh Chaudhury
International Journal of Nanoparticles (IJNP), Vol. 12, No. 1/2, 2020

Abstract: Carbon nanotubes (CNT) field-effect transistor (CNTFET) could be a possible alternative to CMOS technology for future VLSI applications. In this work, a comparative study has been carried out on the effects of technology nodes and logic styles on power dissipation, delay, leakages, etc. The technology nodes that are considered here are 90 nm and 32 nm MOSFET technology, and 32 nm CNTFET technology. The logic families considered here are the conventional complementary metal-oxide-semiconductor (CMOS), complementary pass transistor logic (CPL) and transmission gate (TG). The digital circuits considered are NAND, NOR, XOR and MUX gates. HSPICE simulations have been carried out and observed that at 32 nm CNTFET technology, the least power, worst-case delay and least PDP are found as 15.5 nW, 3.11 ps and 0.048 aJ, respectively. It is witnessed that CNTFET-based logics are superior compared to other logic families at different technology nodes.

Online publication date: Tue, 24-Mar-2020

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanoparticles (IJNP):
Login with your Inderscience username and password:

    Username:        Password:         

Forgotten your password?


Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com