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Vol. 1

International Journal of Surface Science and Engineering

2009 Vol. 3 No. 1/2

Special Issue on Characterisation and Application of Thin Films, Coatings and Modified Surfaces

Guest Editors: Dr. Han Huang and Dr. Jun Ding

 

Editorial
PagesTitle and authors
3-22Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation
Mariusz Martyniuk, Charles A. Musca, John M. Dell, Robert G. Elliman, Lorenzo Faraone
DOI: 10.1504/IJSURFSE.2009.024359

23-43Thin film Li electrolytes for all-solid-state micro-batteries
Hui Xia, Hai Long Wang, Wei Xiao, Man On Lai, Li Lu
DOI: 10.1504/IJSURFSE.2009.024360

44-63Layer-By-Layer assembled thin films of inorganic nanomaterials: fabrication and photo-electrochemical properties
Lianzhou Wang, Fengqiu Tang, Kiyoshi Ozawa, G.Q. (Max) Lu
DOI: 10.1504/IJSURFSE.2009.024361

64-85Determination of Young's modulus and yield strength of porous low-k dielectric films by nanoindentation under complete consideration of the substrate influence
M. Herrmann, F. Richter
DOI: 10.1504/IJSURFSE.2009.024362

86-102Microstructural and topographical changes of Ni-P plated moulds in glass lens pressing
Jun Masuda, Jiwang Yan, Takaharu Tashiro, Yasushi Fukase, Tianfeng Zhou, Tsunemoto Kuriyagawa
DOI: 10.1504/IJSURFSE.2009.024363

103-113Initial layer in FePt perpendicular media with different buffer layers
B.C. Lim, J.S. Chen, G.M. Chow
DOI: 10.1504/IJSURFSE.2009.024364

114-124Some current research in femtosecond laser-induced surface ripple structures
H.Y. Zheng, X.C. Wang, W. Zhou
DOI: 10.1504/IJSURFSE.2009.024365

125-134Packed powder diffusion coating of pure aluminium after surface nanocrystallisation
H-W. Chang, M-X. Zhang
DOI: 10.1504/IJSURFSE.2009.024366

135-144Stress effect on the properties of Ni80Fe20/Au or Cu composite wires via electrodeposition
Jiabao Yi, Xiaoping Li
DOI: 10.1504/IJSURFSE.2009.024367

145-156Performance of Al2O3-3%TiO2 Detonation gun coated ferritic steels in coal fired boiler
Pawan Kumar Sapra, Surendra Singh, Satya Prakash, N. Arivazhagan
DOI: 10.1504/IJSURFSE.2009.024368