Int. J. of Nanomanufacturing   »   2015 Vol.11, No.3/4

 

 

Title: Principle of ultra precision polishing with micro water mist for KDP/DKDP crystals

 

Authors: Hang Gao; Chengpeng Song; Dongming Guo

 

Addresses:
School of Mechanical Engineering, Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, Liaoning, 116024, China
School of Mechanical Engineering, Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, Liaoning, 116024, China
School of Mechanical Engineering, Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, Liaoning, 116024, China

 

Abstract: Potassium dihydrogen phosphate (KDP) or deuterated potassium dihydrogen phosphate (DKDP) crystals are difficult to machine because they are soft and hygroscopic. Based on the deliquescence nature of KDP/DKDP crystals, a novel polishing method with micro water mist for KDP/DKDP crystals was proposed in this paper. The processing principle was investigated and polishing experiments with this method were carried out. The results show that the crystals can be machined by this method and the maximum material removal rate can reach 2.02 µm/min. A polished surface with root-mean-square roughness 47.6 nm was achieved by polishing with micro water mist in 10 min. The material removing principle and the planarisation mechanism were experimentally explained and verified.

 

Keywords: KDP/DKDP crystals; micro water mist; planarisation mechanism; deliquescence; ultra precision polishing; potassium dihydrogen phosphate; deuterated KDP; material removal rate; MRR; surface quality; surface roughness.

 

DOI: 10.1504/IJNM.2015.071916

 

Int. J. of Nanomanufacturing, 2015 Vol.11, No.3/4, pp.150 - 160

 

Submission date: 23 Mar 2015
Date of acceptance: 19 May 2015
Available online: 23 Sep 2015

 

 

Editors Full text accessAccess for SubscribersPurchase this articleComment on this article