Int. J. of Nanomanufacturing   »   2014 Vol.10, No.5/6

 

 

Title: A review: the method for synthesis MoS2 monolayer

 

Author: Zhang Xiaoli

 

Address: School of Materials and Chemical Engineering, Zhong Yuan University of Technology, Zheng Zhou, 450007, China; International Center for Quantum Materials, Peking University, Beijing, 100871, China

 

Abstract: Until now, there were kinds of methods that had been reported to prepare monolayer MoS2, such as solvothermal approach, self-propagating high-temperature synthesis, pulsed electrodeposition, soft chemistry method, laser ablation, liquid exfoliation of bulk MoS2, etching MoS2, physical vapour deposition, chemical vapour deposition(CVD) and exfoliation etc. But among them, most of the gained MoS2 are few layers and in a small size of micron meters, except low-pressure chemical vapour deposition (LPCVD) method. After analysis, it can be easily concluded that when the chosen substrate owning a crystal structure similar to MoS2, like mica, the gained MoS2 monolayer can reach a size of several millimetres, this can be explained by the weak bonding between layer and strong bonding existing in the layer of these kind of crystal. The corresponding experiments showed that this large size monolayer prepared by LPCVD own high quality, which can successfully be exploited for a variety of future applications.

 

Keywords: monolayer MoS2; molybdenum disulphide; low pressure CVD; chemical vapour deposition; LPCVD; synthesis.

 

DOI: 10.1504/IJNM.2014.066297

 

Int. J. of Nanomanufacturing, 2014 Vol.10, No.5/6, pp.489 - 499

 

Submission date: 04 Nov 2013
Date of acceptance: 30 Apr 2014
Available online: 11 Dec 2014

 

 

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