Int. J. of Nanomanufacturing   »   2013 Vol.9, No.3/4

 

 

Title: Effect of ethylene glycol variation on silica antireflective coatings

 

Authors: Ruimin Jin; Xinfeng Guo; Zhiduan Cai; Limin Cang; Tao Yan

 

Addresses:
Institute of Solar Cell Nanyang Institute of Technology, Henan 473004, China; Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China
Institute of Solar Cell Nanyang Institute of Technology, Henan 473004, China
Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China
Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China
Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China

 

Abstract: A new type of sol-gel process addition of ethylene glycol has been developed. Sol-gel derived bulk and thin films were prepared from different compositions containing varying concentrations of ethylene glycol from 5% to 15% at constant water (H2O)/tetraethyl-orthosilicate (TEOS) ratio. Scanning electronic microscope (SEM) was carried out to monitor the effects of concentration of ethylene glycol on the internal environment of sol-gel materials. Sol-gel thin films, prepared by rotating coating technique were depicted uniform and cracked surface at rotating speed 2,000 r/min (high speed) and 800 r/min (low speed) respectively. It was shown that an antireflective film produced by incorporation of ethylene glycol in the precursor solution is a more effective method to effect the uniformly porous structures of SiO2 thin film on the glass substrate. The surface of the film on glass substrates is seen to exist in different conditions with different compositions of ethylene glycol.

 

Keywords: sol-gel; nanotechnology; ethylene glycol; silica antireflective coatings; thin films; glass substrates.

 

DOI: 10.1504/IJNM.2013.056055

 

Int. J. of Nanomanufacturing, 2013 Vol.9, No.3/4, pp.295 - 302

 

Submission date: 27 Sep 2012
Date of acceptance: 16 Jan 2013
Available online: 29 Aug 2013

 

 

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