Int. J. of Nanomanufacturing   »   2012 Vol.8, No.4

 

 

Title: 213 nm pitch standards fabricated using atomic lithography

 

Authors: Yan Ma; Weigang Gong; Wanjing Zhang; Tongbao Li

 

Addresses:
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai, 20092, China.
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai, 20092, China.
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai, 20092, China.
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Department of Physics, Tongji University, Shanghai, 20092, China

 

Abstract: Atomic lithography is a technique in which nearly resonant light is used to pattern an atom beam periodically. In this article, a 425 nm laser light standing wave is used to focus a beam of chromium atoms to fabricate the period of the nanoscale pitch standards of 213 ± 0.1 nm. The height was 4 nm. The (FWHM) width is 64 ± 6 nm. And this result will be analysed theoretically. The tracing of atoms is numerical simulated based on particle-optics and the factors of affecting deposition result will be found in this article.

 

Keywords: nanopitch standards; atomic lithography; cooled atoms; nanoscale pitch standards; nanotechnology; atom tracing; numerical simulation; particle optics.

 

DOI: 10.1504/IJNM.2012.048587

 

Int. J. of Nanomanufacturing, 2012 Vol.8, No.4, pp.348 - 356

 

Submission date: 14 Oct 2011
Date of acceptance: 26 Mar 2012
Available online: 17 Aug 2012

 

 

Editors Full text accessAccess for SubscribersPurchase this articleComment on this article