Title: Preparation and characterisation of carbon nitride films deposited by pulsed laser arc deposition

Authors: L. Yin, T.M. Shao, S.B. Wei, Y.Q. Zhou

Addresses: State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China. ' State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China. ' State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China. ' State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, PR China

Abstract: Carbon nitride (CN_x) films were prepared on silicon substrates by pulsed laser arc deposition with different working gases and various gas pressures. The bonding structure and the chemical compositions of the resulting CN_x films were studied by AES, Raman spectroscope and XPS, respectively. The results showed that the average nitrogen content varied between 9% and 28%, and masses of sp² C–N bond and sp³ C–N bond formed in the CN_x films. The nanohardness decreased from 30 GPa to 6 GPa, whereas the friction coefficient increased with increasing nitrogen content in the resulting CN_x films.

Keywords: carbon nitride films; pulsed laser arc deposition; nanohardness; friction coefficient; bonding structure; chemical composition; nitrogen content.

DOI: 10.1504/IJSURFSE.2010.033252

International Journal of Surface Science and Engineering, 2010 Vol.4 No.3, pp.250 - 257

Published online: 14 May 2010 *

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