Title: PCD dresser for dressing CMP polyurethane pads

Authors: M.Y. Tsai, J.C. Sung

Addresses: Department of Mechanical Engineering, National Chinyi Technology of University, No. 1, Sec. 4, Roosevelt Rd., Taipei 106, Taiwan. ' Kinik Company, 64, Chung-San Rd., Ying-Kuo, Taipei Hsien 239, Taiwan

Abstract: This paper investigating a revolutionary design of pad conditioners is based on carving a structure out of sintered polycrystalline diamond (PCD) matrix. The PCD dresser is manufactured by wire electro discharge machining to form cutting pyramids of a specific size with a designed shape. The dressing characteristics of pad surface textures are studied by comparison with conventional diamond pad conditioner. Experimental results indicate that the PCD dresser can dress asperities of the pad more uniformly than the conventional diamond dresser due to PCD dresser having identically shaped tip and the same height diamond. In addition, the cutting rate of PCD dresser for IC1000 pad not only is reduced by about 30% and also it can dress pad more effectively than conventional diamond dresser.

Keywords: chemical mechanical polishing; CMP; polishing pads; diamond conditioner; pad dressing; abrasive technology; pad conditioners; sintered PCD; polycrystalline diamond; wire EDM; surface texture; diamond dressers; polyurethane pads.

DOI: 10.1504/IJAT.2010.032462

International Journal of Abrasive Technology, 2010 Vol.3 No.1, pp.51 - 62

Received: 18 Nov 2009
Accepted: 19 Nov 2009
Published online: 03 Apr 2010 *

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