Title: Titanium oxidation by RF inductively coupled plasma

Authors: R. Valencia-Alvarado, R. Lopez-Callejas, S.R. Barocio, A. Mercado-Cabrera, R. Pena-Eguiluz, A.E. Munoz-Castro, A. De la Piedad-Beneitez, J.M. De La Rosa-Vazquez

Addresses: Plasma Physics Laboratory, Instituto Nacional de Investigaciones Nucleares, AP 18-1027, 11801 Mexico D.F., Mexico. ' Plasma Physics Laboratory, Instituto Nacional de Investigaciones Nucleares, AP 18-1027, 11801 Mexico D.F., Mexico. ' Plasma Physics Laboratory, Instituto Nacional de Investigaciones Nucleares, AP 18-1027, 11801 Mexico D.F., Mexico. ' Plasma Physics Laboratory, Instituto Nacional de Investigaciones Nucleares, AP 18-1027, 11801 Mexico D.F., Mexico. ' Plasma Physics Laboratory, Instituto Nacional de Investigaciones Nucleares, AP 18-1027, 11801 Mexico D.F., Mexico. ' Plasma Physics Laboratory, Instituto Nacional de Investigaciones Nucleares, AP 18-1027, 11801 Mexico D.F., Mexico. ' Instituto Tecnologico de Toluca, AP 890, Toluca, Mexico. ' ESIME-Zacatenco-IPN, 07738 Mexico D.F., Mexico

Abstract: We report on recent results obtained from the oxidation process of pure titanium substrates carried out in up to 500 W plasmas contained in a cylindrical Pyrex vessel inductively coupled to a 13.56 MHz RF generator, in gas pressures varying from ~10−3 to 100 mbar with the samples being biased down to -3,000 V DC. The experimental outcome is of particular interest to the medical sector as it concerns the production of biomaterials required by prosthesis and implants. The plasma was developed from a 20% oxygen and 80% argon gas mixture and applied for ~6 hour processing periods. The sample temperature was controlled by means of the gas pressure, the plasma power and the bias voltage. Thus, the best quality oxidation was accomplished at 5 × 10−2 mbar and 680°C where the implantation/diffusion of oxygen attracts the lowest rate of sputtering. Thus, the rutile phases of TiO2 and α-TiO were produced with ~66 at. % oxygen contents corresponding to an O/Ti ratio close to 1.94 on the surface and a 5 μm thick modified layer.

Keywords: titanium dioxide; TiO2; biomaterials; surface morphology; RF reactive sputtering; oxygen ion implantation; oxidation; medical prostheses; medical implants.

DOI: 10.1504/IJNM.2010.029923

International Journal of Nanomanufacturing, 2010 Vol.5 No.1/2, pp.62 - 68

Published online: 03 Dec 2009 *

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