Title: Methodology for conducting screening-level ecological risk assessments for hazardous waste sites. Part III: exposure and effects assessment

Authors: Janet E. Kester, Robin L. VanHorn, Nancy L. Hampton

Addresses: Dames & Moore, Inc., Suite 2500, 633 17th St, Denver, CO, 80202-3625, USA. ' Idaho National Engineering and Environmental Laboratory, Lockheed Martin Idaho Technologies Company, P.O. Box 1625, Idaho Falls, ID 83415-3960, USA. ' Idaho National Engineering and Environmental Laboratory, Lockheed Martin Idaho Technologies Company, P.O. Box 1625, Idaho Falls, ID 83415-3960, USA

Abstract: The Idaho National Engineering and Environmental Laboratory (INEEL) has implemented a phased approach to ecological risk assessment (ERA). The first step in this process is a screening-level ERA at each facility. Basic to this approach was the development of ecologically based screening levels (EBSLs), defined as concentrations of chemicals in soil (or other media) that are not expected to produce any adverse effects on selected ecological receptors under chronic exposure conditions (analogous to preliminary remediation goals or soil screening levels). EBSLs are calculated by rearrangement of standard exposure equations to solve for soil concentration when chemical intake rate is set at a developed toxicity reference value (TRV). A TRV is defined as a chronic dose that is likely to be without appreciable risk of deleterious effects. This definition was extended to define TRVs and ultimately EBSLs for the functional groups used in the INEEL screening-level ERAS.

Keywords: assessment endpoints; ecological risk assessment; ecological organisations; functional groups; Idaho National Engineering and Environmental Laboratory; hazardous waste sites; screening assessments; USA; United States; environmental pollution; effects assessment; exposure assessment; receptor of concern; toxicity reference values.

DOI: 10.1504/IJEP.1998.028259

International Journal of Environment and Pollution, 1998 Vol.9 No.1, pp.62 - 89

Published online: 15 Sep 2009 *

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