Title: MaTT, an automatic toolpath generator for laser-patterning high-aspect-ratio microstructures in photosensitive materials

Authors: Janet A. Stillman, Jack W. Judy, Henry Helvajian

Addresses: Electrical Engineering Department, University of California, Los Angeles 420 Westwood Plaza, UCLA Box 159410, Los Angeles, 90095-1594 CA, USA; Micro/Nano Technology Department, The Aerospace Corporation, P.O. Box 92957, Los Angeles, 90009 CA, USA. ' Electrical Engineering Department, University of California, Los Angeles, 420 Westwood Plaza, UCLA Box 159410, Los Angeles, 90095-1594 CA, USA. ' Micro/Nano Technology Department, The Aerospace Corporation, P.O. Box 92957, Los Angeles, 90009 CA, USA

Abstract: Although software exists to support the design of microelectromechanical systems fabricated with mask-based photolithography, software to generate the Computer Numerically Controlled (CNC) toolpath instructions to direct-write-pattern with lasers lags behind. This lack has slowed the development of Photostructurable Glass-Ceramics (PSGCs) for aerospace applications. A new software package, MaTT (Mask-To-Toolpath), translates designs represented in an industry-standard mask format, Caltech Interchange Format (CIF), into toolpaths for laser-patterning photosensitive materials. PSGC structures fabricated using MaTT illustrate the process. MaTT will soon be harnessed for a major research effort on glass nanosatellites. MaTT is freely available by email request.

Keywords: CNC tool paths; tool path generation; laser direct write processing; microfabrication; photostructurable glass ceramic; PSGC; laser patterning; microstructure; photosensitive materials; microelectromechanical systems; MEMS; aerospace manufacturing; glass nanosatellites; nanosats; satellite design.

DOI: 10.1504/IJMR.2008.016454

International Journal of Manufacturing Research, 2008 Vol.3 No.1, pp.114 - 134

Published online: 29 Dec 2007 *

Full-text access for editors Full-text access for subscribers Purchase this article Comment on this article