Title: Complex and useful polymer micro- and nanostructures via nanoimprint lithography

Authors: Hong Yee Low

Addresses: Institute of Materials Research and Engineering, 3, Research Link, 117602 Singapore

Abstract: This paper presents an overview on three major fabrication techniques developed in our laboratory for achieving complex polymeric structures using nanoimprint lithography (NIL), namely reversal imprinting, combinatorial-mould imprinting and sequential imprinting. The key strategy employed by all three techniques is the use of conventional two-dimensional (2D) molds to achieve greater degrees of complexity than are ordinarily achievable with conventional imprinting techniques. For example, reversal imprinting combined with colloidal self-assembly allows for structures that have variations with depth as well as scale. Combinatorial-mould imprinting enables the fabrication of three-dimensional (3D) structures that have variations in length, width as well as depth. Sequential imprinting enables hierarchical structures that have scale-dependent variations and complexity. 3D structures, hierarchical structures, and combinations thereof are obtained in fewer processing steps and without the use of a sacrificial component or process.

Keywords: nanoimprint lithography; 2D; 3D; hierarchical structures; polymers; polymer microstructures; polymer nanostructures; nanotechnology; reversal imprinting; combinatorial mould imprinting; sequential imprinting; colloidal self-assembly.

DOI: 10.1504/IJNT.2007.013973

International Journal of Nanotechnology, 2007 Vol.4 No.4, pp.389 - 403

Published online: 05 Jun 2007 *

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