Title: Thin film nanomanufacturing of functionally graded titanium-based microcutting tools

Authors: Mark J. Jackson, Grant M. Robinson, Michael D. Whitfield, Wolf-Dieter Munz

Addresses: Birck Nanotechnology Center, College of Technology, Purdue University, West Lafayette, IN 47907-2021, USA. ' Center for Advanced Manufacturing, College of Technology, Purdue University, West Lafayette, IN 47907-2021, USA. ' Center for Advanced Manufacturing, College of Technology, Purdue University, West Lafayette, IN 47907-2021, USA. ' Materials Research Institute, Sheffield Hallam University, Pond Street, Sheffield, UK

Abstract: This paper discusses the deposition of functionally graded thin solid films to microscale cutting edges where very thin layers ∼3nm in thickness are used to transport heat away from the contact zone, increase lubricity, act as a diffusion barrier and improve the hot hardness of the cutting edge of the microtool. This paper describes how thin films are generated to create a fully functional three-dimensional nanomanufactured film using Physical Vapour Deposition (PVD) processes. The conclusions drawn from this study show that cutting tool edge preparation has a significant effect on the performance of microscale cutting tools.

Keywords: thin films; microelectromechanical systems; MEMS; nanomanufacturing; functional coatings; titanium; microcutting tools; microscale cutting edges; physical vapour deposition; PVD.

DOI: 10.1504/IJNM.2007.013682

International Journal of Nanomanufacturing, 2007 Vol.1 No.3, pp.343 - 356

Published online: 11 May 2007 *

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