The influence of pre-treatment of poly(ethylene terephthalate) on its barrier properties base on ALD Al2O3 Online publication date: Fri, 22-Mar-2019
by Ming Fang; Lizhen Yang; Wenwen Lei; Lijun Sang; Zhongwei Liu; Qiang Chen
International Journal of Nanotechnology (IJNT), Vol. 15, No. 8/9/10, 2018
Abstract: Atomic layer deposition (ALD) is a type of chemical vapour deposition (CVD), except the alternative purging precursor and oxidant/reductant, which react in self-limiting mode to grow the desired products in a binary reaction cycle. Owing to the two sequential half-reactions, the film growth in ALD technique is dense and compounds control. In this work, we employ thermal ALD (T-ALD) to grow Al2O3 on pre-treated poly(ethylene terephthalate) (PET) surface with the purpose of improvement of the barrier properties. The different interfacial species are obtained by a variety of pre-treatments with -COOH, -NH3, -OH, -CO- and -COOH as well as SiCHO groups on surfaces. We find that O2 plasma treatment can lead to the nucleation particles of Al2O3 that are relatively dense and small on PET, which is believed to promote Al2O3growth in pinhole-free mode and provide better barrier properties.
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