Periodic upright nanopyramid fabricated by ultraviolet curable nanoimprint lithography for thin film solar cells
by Amalraj Peter Amalathas; Maan M. Alkaisi
International Journal of Nanotechnology (IJNT), Vol. 14, No. 1/2/3/4/5/6, 2017

Abstract: In this work, a periodic upright nanopyramid structure was developed for light harvesting applications suitable for thin film solar cells. The periodic inverted nanopyramid structure was fabricated on Si substrate by laser interference lithography (LIL) and subsequent pattern transfer by combined reactive ion etching and KOH wet etching. The silicon substrate was used as a master mould in the replication process utilising ultraviolet curable nanoimprint lithography (UV-NIL) process. The inverted nanopyramid patterns were transferred onto OrmoStamp resist layer to form upright pyramids on glass substrates by UV-NIL. The replicated periodic upright nanopyramid structures can be used as light trapping structures in thin film solar cells and as soft mould in the 3D imprint process.

Online publication date: Fri, 24-Feb-2017

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanotechnology (IJNT):
Login with your Inderscience username and password:

Username:        Password:          Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com