Height measurement of single nanoparticles based on evanescent field modulation
by Takayuki Kurihara; Ryuichi Sugimoto; Ryota Kudo; S. Takahashi; K. Takamasu
International Journal of Nanomanufacturing (IJNM), Vol. 8, No. 5/6, 2012

Abstract: We propose a novel height measurement method for single nanoparticles illuminated by an evanescent field in the total internal reflection microscopy scheme. The method utilises the scattered light intensity response to incident angle modulation. We introduced a physical model to derive a height measurement formula, and confirmed its validity through numerical simulations based on Maxwell's equation. We also verified the practical feasibility of the proposed method and confirmed that under an incident angle error of less than 0.1°, height measurement error of less than 10 nm could be achieved.

Online publication date: Thu, 21-Aug-2014

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanomanufacturing (IJNM):
Login with your Inderscience username and password:

    Username:        Password:         

Forgotten your password?


Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com