A new float-polishing technique with large clearance utilising magnetic compound fluid Online publication date: Tue, 30-Sep-2008
by Kunio Shimada, Yoshio Matsuo, Keita Yamamoto, Yongbo Wu
International Journal of Abrasive Technology (IJAT), Vol. 1, No. 3/4, 2008
Abstract: This report described a new float-polishing technique with large clearance utilising a newly developed magnetic responsive fluid, Magnetic Compound Fluid (MCF) developed by one of the authors, Shimada, in 2001. Before the present study, a clearance of up to 0.1 mm had been obtained through the use of MCF in float polishing. MCF was then improved by the addition of α-cellulose. A clearance as large as 8 mm could then be achieved in float polishing. The polishing results showed a finely polished, and mirror-like surface with a nm-order Ra for various kinds of polished material was obtained. The mechanism of our proposed polishing technique was explained in terms of a magnetic cluster model by using the experimental results regarding polished surface roughness under the abrasive particles condition of the MCF. The results obtained by this polishing technique were also compared to those obtained by utilising ordinary magnetic responsive fluids, that is, Magnetic Fluid (MF) or magnetorheological fluid.
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